The RTP Tube Furnace RTP-1000-LV3F with three-channel flow mixing is specifically designed for annealing semiconductor wafers, solar cells, and other samples (up to 3 inches). It is equipped with thre
The 4" High Vacuum RTP Tube Furnace OTF-1200X-4-RTP-HV is a compact rapid thermal processing tube furnace equipped with a 4" quartz tube and a high vacuum system (mechanical pump + molecular pump). It
The Slideable RTP Furnace OTF-1200X-4-RTP-SL is a rapid thermal processing furnace that utilizes infrared lamp heating and a movable furnace body for quick cooling, achieving a maximum heating rate of
The Compact 1000℃ RTP Furnace OTF-1200X-4-RTP is a sleek rapid thermal processing tube furnace equipped with a 4" quartz tube and a vacuum flange, specifically designed for the annealing of semiconduc
The OTF-1200X-S-DVD is a compact movable crucible tube furnace that utilizes magnets to drive the crucible's movement. With a tube diameter of 50mm and a maximum operating temperature of 1200℃, this d
OTF-1200X-IR-IISL is a RTP tube furnace with dual-zone IR heated 4" ID quartz tube and two sliding sample holders for Lab use,compact and easy operation. It is capable of achieving a maximum heating r
RTP-M1 is a desktop Ultrafast thermal Pressing Furnace ( UFTP) with a heating speed of more than 2000C/minute heating rate,Max 2900°C under the selectable deadweight and controlled atmosphere.
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RTP-MS is an Ultrafast Heating Pressing Furnace ( UHP) ) with a heating speed of more than 200oC/minute up to 2900°C and Max. 500 kg Load inside an ultra-high vacuum chamber made of stainless settle
OTF-1200X-RTP-II is a two-heating zone rapid thermal processing furnace with 11" O.D quartz tube. It is designed for PVD or CSS (Close Spaced Sublimation) film coating up to 3" diameter or 2"x2" squar
SUP-RTP-II-5-R is an advanced rapid thermal processing furnace, which is designed for CSS (Close Spaced Sublimation) film coating up to 5" circular or square wafer samples at the working temperature o
OTF-1200X-RTP-II-CSS-300 is an advanced rapid thermal processing (RTP) furnace, which is designed for CSS (Close Spaced Sublimation) film coating up to 12" wafer at the working temperature of 950°C M
GSL-1500X-50RTP is a slideable tube furnace that utilizes 50 mm OD x 44mm ID x 304.8 mm (12") L mullite or quartz tubes (one end closed). The maximum working temperature of this furnace is 1500ºC. A
OTF-1200X-RTP-5S is a 5” sliding furnace with resistance heating and an electric sliding motor for rapid heating and cooling. It is capable of achieving a max. heating cooling rate 2°C/4°C per second
OTF-1200X-S-50-DFSL is a dual slidable RTP Tube furnace on the rail. It is a tool for thermal CVD with 2" ODx55"L Quartz tube & flanges and max 1200°C achievable working temperature.
OTF-1500X-II-50SL is a 1500°C Two Zone slide-able tube furnace with 50mm OD x 55"L mullite tube and vacuum flanges. One pair of sliding rail is installed on the bottom of the furnace.
OTF-1200X-50-SL is a compact automatic sliding tube furnace with 2" OD x 36" L Quartz tube and flanges with 1200°C max. working temperature. The automatic sliding mechanism allows the furnace to slide
OTF1200XSDFPESL is a dual slidable PECVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system. It is a tool for PECVD with 2" ODx55"L Quartz tube & flanges and a max 1200°C achievable worki
OTF-1200X-DVD-M is a splittable tubular furnace with a crucible sliding function (manually pushing ) in a high vacuum or air-tight atmosphere, with a maximum temperature of 1200 °C. The vacuum-sealed
OTF-1200X-5-SL is a 5” sliding furnace with resistance heating and an electric sliding motor for rapid heating and cooling. It is capable of achieving a max. heating cooling rate > 10°C/s and anneals
OTF-1200XS6-ASD is a 6" OD automatic tube furnace up to 1200°C. It automates the pump-purge cycles, gas flow, heating, and cooling in a sequence via one click via PC. With the assistance of a robot fo